Advantage of heteroepitaxial GaSb thin-film buffer and GaSb dot nucleation layer for GaSb/AlGaSb multiple quantum well structure grown on Si(1 0 0) substrate by molecular beam epitaxy

Ryuto Machida(Tokyo University of Science), Hiroki I. Fujishiro(Tokyo University of Science), Sachie Fujikawa(Tokyo University of Science), Akifumi Kasamatsu(National Institute of Information and Communications Technology), Issei Watanabe(National Institute of Information and Communications Technology), Kouichi Akahane(National Institute of Information and Communications Technology), Shinsuke Hara(National Institute on Consumer Education)
Journal of Crystal Growth
November 23, 2018
Cited by 5


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