Wafer-scale nanopatterning using fast-reconfigurable and actively-stabilized two-beam fiber-optic interference lithography

Chuwei Liang(University of Hong Kong), Wen‐Di Li(Institut de Recherche et d’Innovation), Jingxuan Cai(University of Hong Kong), Tuo Qu, Zhouyang Zhu(Jiaxing University), Shijie Li
Optics Express
March 21, 2018
Cited by 20


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