Wafer-scale nanopatterning using fast-reconfigurable and actively-stabilized two-beam fiber-optic interference lithography
Chuwei Liang(University of Hong Kong), Wen‐Di Li(Institut de Recherche et d’Innovation), Jingxuan Cai(Zhejiang University), Tuo Qu, Zhouyang Zhu(University of California, Berkeley), Shijie Li
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