Characterization of NiCrO<inf>x</inf> thin films deposited by reactive sputtering at different O<inf>2</inf> flow rate
He Yu(University of Electronic Science and Technology of China), Ruilin Wu(University of Illinois Urbana-Champaign), Tao Wang(Northwestern Polytechnical University), Xiaohui Wang(Henan Academy of Sciences), Shuanghong Wu(University of Electronic Science and Technology of China), Jun Gou(University of Electronic Science and Technology of China), Xiang Dong(University of Electronic Science and Technology of China), Yadong Jiang(Fudan University)
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