Ferroelectric Domain Structure of<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msub><mml:mrow><mml:mi>SrBi</mml:mi></mml:mrow><mml:mrow><mml:mn>2</mml:mn></mml:mrow></mml:msub></mml:mrow><mml:mrow><mml:msub><mml:mrow><mml:mi>Nb</mml:mi></mml:mrow><mml:mrow><mml:mn>2</mml:mn></mml:mrow></mml:msub></mml:mrow><mml:mrow><mml:msub><mml:mrow><mml:mi>O</mml:mi></mml:mrow><mml:mrow><mml:mn>9</mml:mn></mml:mrow></mml:msub></mml:mrow></mml:math>Epitaxial Thin Films
M. A. Zurbuchen(Argonne National Laboratory), S. K. Streiffer(Argonne National Laboratory), Darrell G. Schlom(Cornell University), G. Asayama(Pennsylvania State University)
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