A 40-nm 16-Mb Contact-Programming Mask ROM Using Dual Trench Isolation Diode Bitcell
Yong Ye(Anhui University), Bomy Chen(Microchip Technology (Germany)), Yong Cheol Kang(Huazhong University of Science and Technology), Chao Zhang(Semiconductor Manufacturing International (China)), Y.D. Chan(Semiconductor Manufacturing International (China)), Zhitang Song(Chinese Academy of Sciences), Hanming Wu(University of California, Los Angeles), Shiuh-Wuu Lee(Semiconductor Manufacturing International (China))
IEEE Transactions on Very Large Scale Integration (VLSI) Systems
July 17, 2015
Cited by 5
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