Sub-10 nm low current resistive switching behavior in hafnium oxide stack
Yi Hou(Hengyang Normal University), W. Vandervorst(IMEC), Ali Youssef(IMEC), Zheng Xu(IMEC), Umberto Celano(Arizona State University), Jian Kang(Peking University), A. Fantini(IMEC), R. Degraeve(IMEC), L Liu(Peking University), L. Goux(IMEC), M. Jurczak(IMEC)
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