Sub-10 nm low current resistive switching behavior in hafnium oxide stack
Yi Hou(National University of Singapore), W. Vandervorst(IMEC), Ali Youssef(IMEC), Zheng Xu(IMEC), Umberto Celano(Arizona State University), Jian Kang(Peking University), A. Fantini(IMEC), R. Degraeve(IMEC), L Liu(Peking University), L. Goux(IMEC), M. Jurczak(IMEC)
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