Measurement of the backscatter coefficient using resist response curves for 20–100 keV electron beam lithography on Si

G. P. Watson, Christopher J. Biddick, Diana Fu(University of Toronto), Steven D. Berger(Integrated Systems Solutions (United States)), Linus A. Fetter, D. M. Tennant(University of Tennessee at Knoxville), Anthony E. Novembre

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena

November 1, 1996

10.1116/1.588590

Cited by 23

Related Papers

Proximate Kitaev quantum spin liquid behaviour in a honeycomb magnet

|Unknown|2016|863

Neutron scattering in the proximate quantum spin liquid α-RuCl <sub>3</sub>

|Science|2017|724

Quantum Criticality in an Ising Chain: Experimental Evidence for Emergent E <sub>8</sub> Symmetry

|Science|2010|722

Discrete Resistance Switching in Submicrometer Silicon Inversion Layers: Individual Interface Traps and Low-Frequency (<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mfrac><mml:mrow><mml:mn>1</mml:mn></mml:mrow><mml:mrow><mml:mi>f</mml:mi></mml:mrow></mml:mfrac></mml:math>?) Noise

|Physical Review Letters|1984|711

Dirac Strings and Magnetic Monopoles in the Spin Ice Dy <sub>2</sub> Ti <sub>2</sub> O <sub>7</sub>

|Science|2009|607