Environmental Effects on Subcritical Delamination of Dielectric and Metal Films from Organosilicate Glass (OSG) Thin Films

Neil Y. C. Lin(California NanoSystems Institute), Andrew J. McKerrow(Texas Instruments (United States)), Joost J. Vlassak(Harvard University), Ting Y. Tsui(Advanced Micro Devices (United States))
MRS Proceedings
January 1, 2003
Cited by 17


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