Re-Examining The Physical Basis of Pattern Density and Step Height CMP Models

Xiaolin Xie(Shanghai Eye Disease Prevention & Treatment Center), Duane S. Boning(Massachusetts Institute of Technology), Hong Cai(Institute of Microelectronics), Tamba Tugbawa(Massachusetts Institute of Technology), Brian Lee(Sisters of Mercy Health System), Tae Park(Massachusetts Institute of Technology)
MRS Proceedings
January 1, 2003
Cited by 10


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