Effect of $\hbox{SiN}_{x}$ Gate Dielectric Deposition Power and Temperature on a-Si:H TFT Stability
Alex Z. Kattamis(Princeton University), S. Wagner(Princeton University), H. Glesková(Princeton University), James C. Sturm(Princeton University), Kunigunde H. Cherenack(Princeton University), Bahman Hekmatshoar(Princeton University), I‐Chun Cheng(Princeton University)
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