Subcritical Delamination of Dielectric and Metal Films from Low-k Organosilicate Glass (OSG) Thin Films in Buffered pH Solutions
Neil Y. C. Lin(California NanoSystems Institute), Andrew J. McKerrow(Texas Instruments (United States)), Joost J. Vlassak(Harvard University), Ting Y. Tsui(Advanced Micro Devices (United States))
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