Investigation and optimization of the magnetic field configuration in high-power impulse magnetron sputtering

He Yu(University of Electronic Science and Technology of China), D. N. Ruzic(University of Illinois Urbana-Champaign), Tae S. Cho(University of Illinois Urbana-Champaign), Matthew Szott(University of Illinois Urbana-Champaign), J. McLain(University of Illinois Urbana-Champaign), Liang Meng(University of Illinois Urbana-Champaign)
Plasma Sources Science and Technology
July 5, 2013
Cited by 28


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