Alternating PSM for sub-60-nm DRAM gate single exposure

Kunyuan Chen(Nanya Technology (Taiwan)), Jengping Lin(Nanya Technology (Taiwan)), ChungPing Hsia(Nanya Technology (Taiwan)), Chiang-Lin Shih(Nanya Technology (Taiwan)), Richard Lu(Nanya Technology (Taiwan)), Kuo Fu(Tongji University)
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
October 6, 2006
Cited by 0


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