<title>Advanced process control for poly-Si gate etching using integrated CD metrology</title>
Gowri P. Kota(Lam Research (United States)), Ady Levy(KLA (United States)), Vahid Vahedi(Lam Research (United States)), Ashok Khathuria(Advanced Micro Devices (United States)), Jorge Luque(Lam Research (United States)), Thaddeus G. Dziura(KLA (United States))
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
June 30, 2003
Cited by 9
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