Growth Mode and Surface Structure of Cr Ultrathin Film on Fe/Cu(001)

Satoshi Tohoda(Hiroshima University), M. Nagira(Hiroshima University), Tetsuro Ueno(Hiroshima University), Tetsuro Tagashira(Hiroshima University), A. Kimura(Hiroshima University), Masahiro Sawada(Japan Synchrotron Radiation Research Institute), H. Namatame(Hiroshima University), M. Taniguchi(Japan Synchrotron Radiation Research Institute)
e-Journal of Surface Science and Nanotechnology
January 1, 2008
10.1380/ejssnt.2008.251
Cited by 0Open Access
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Abstract

We hereby report a growth mode and surface structure of ultrathin Cr films on fcc Fe/Cu(001). We have found a clear RHEED intensity oscillation during Cr deposition up to four monolayers on 3 and 6 ML Fe/Cu(001), indicating an layer-by-layer growth. Besides, the observed (2×1) LEED pattern at low Cr thickness is similar to that of fcc Fe/Cu(001) in the 5-11 ML thickness range. We have also demonstrated the Cr/Fe multilayer growth with single monolayer of Cr inserted between fcc Fe layers. [DOI: 10.1380/ejssnt.2008.251]

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