Effects of mirror surface roughness on exposure field uniformity in synchrotron x-ray lithography
G Margaret Wells(University of Wisconsin–Madison), JR Maldonado(IBM (United States)), C. Welnak(University of Wisconsin–Madison), Scott A. Turner(Dartmouth–Hitchcock Medical Center), R. Nachman(University of Wisconsin–Madison), Simrjit Singh(University of Wisconsin–Madison), Jing Guo(University of Science and Technology of China), Muhammad Burhan Khan(University of Wisconsin–Madison), Y. Vladimirsky(IBM (United States)), F. Cerrina(University of Wisconsin–Madison)
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena
November 1, 1991
Cited by 4
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