Room-Temperature All-Semiconducting Sub-10-nm Graphene Nanoribbon Field-Effect Transistors

Xinran Wang(Stanford University), Yijian Ouyang(University of Florida), Xiaolin Li(Stanford University), Hailiang Wang(Stanford University), Jing Guo(University of Florida), Hongjie Dai(Stanford University)
Physical Review Letters
May 20, 2008
Cited by 1,485Open Access
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Abstract

Sub-10 nm wide graphene nanoribbon field-effect transistors (GNRFETs) are studied systematically. All sub-10 nm GNRs afforded semiconducting FETs without exception, with ${I}_{\mathrm{on}}/{I}_{\mathrm{off}}$ ratio up to ${10}^{6}$ and on-state current density as high as $\ensuremath{\sim}2000\text{ }\text{ }\ensuremath{\mu}\mathrm{A}/\ensuremath{\mu}\mathrm{m}$. We estimated carrier mobility $\ensuremath{\sim}200\text{ }\text{ }{\mathrm{cm}}^{2}/\mathrm{V}\text{ }\mathrm{s}$ and scattering mean free path $\ensuremath{\sim}10\text{ }\text{ }\mathrm{nm}$ in sub-10 nm GNRs. Scattering mechanisms by edges, acoustic phonon, and defects are discussed. The sub-10 nm GNRFETs are comparable to small diameter ($d\ensuremath{\le}\ensuremath{\sim}1.2\text{ }\text{ }\mathrm{nm}$) carbon nanotube FETs with Pd contacts in on-state current density and ${I}_{\mathrm{on}}/{I}_{\mathrm{off}}$ ratio, but have the advantage of producing all-semiconducting devices.


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