Experimental result and simulation analysis for the use of pixelated illumination from source mask optimization for 22nm logic lithography process
Kafai Lai, Carsten Russ(Broad Institute), Jaione Tirapu-Azpiroz, Manfred Maul(Carl Zeiss (Germany)), Geoffrey W. Burr(IBM Research - Almaden), Alfred Wagner(IBM (United States)), J. Zimmermann(Carl Zeiss (Germany)), Joost Hageman(ASML (Netherlands)), Christoph Hennerkes(Carl Zeiss (Germany)), Frank Hartung(Carl Zeiss (Germany)), M. Hibbs, Alan E. Rosenbluth(IBM (United States)), Frank Rohmund(Carl Zeiss (Germany)), Saeed Bagheri, Remco Groenendijk(ASML (Netherlands)), Emily Gallagher, André Engelen(ASML (Netherlands)), John A. Hoffnagle(IBM Research - Almaden), Martin Burkhardt(IBM (United States)), Donis G. Flagello, Moutaz Fakhry(Mentor Technologies), Bernhard Kneer(Carl Zeiss (Germany)), Rene Carpaij(ASML (Netherlands)), Robert Kazinczi(ASML (Netherlands)), Greg McIntyre, Daniel Corliss, Young Kim(IBM Research - Almaden), David Melville(IBM (United States)), Kehan Tian, Scott Halle, Tom Faure
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
March 6, 2009
Cited by 47
Related Papers
A Draft Sequence of the Neandertal Genome
|Science|2010|4.6k
Solution hybrid selection with ultra-long oligonucleotides for massively parallel targeted sequencing
|Nature Biotechnology|2009|1.5k
Analyzing and minimizing PCR amplification bias in Illumina sequencing libraries
|Genome biology|2011|1.2k