Growth of multioxide planar film with the nanoscale inner structure via anodizing Al/Ta layers on Si
Alexander Mozalev(Belarusian State University of Informatics and Radioelectronics), Hiroki Takahashi(Takenaka (Japan)), Sergiy Borodin(Max Planck Society), Masatoshi Sakairi(Hokkaido University), Achim Walter Hassel(Johannes Kepler University of Linz), Andrew J. Smith(Intel (United States)), A. N. Plihauka(Belarusian State University of Informatics and Radioelectronics)
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