Coherent Chip-Scale Modeling for Copper CMP Pattern Dependence

Hong Cai(Institute of Microelectronics), Jeong‐Gun Lee(SK Group (United States)), Hyungjun Kim(SK Group (United States)), Youngsoo Kang(SK Group (United States)), Tae Park(Massachusetts Institute of Technology), Sibum Kim(SK Group (United States)), Duane S. Boning(Massachusetts Institute of Technology)
MRS Proceedings
January 1, 2004
Cited by 8


Related Papers