Ultrahigh-Density Nanowire Arrays Grown in Self-Assembled Diblock Copolymer Templates

Thomas Thurn‐Albrecht(Ingenierie des Materiaux polymeres), J. Schotter(University of Massachusetts Amherst), G. Kästle(University of Massachusetts Amherst), N. C. Emley(University of Massachusetts Amherst), T. Shibauchi(Los Alamos National Laboratory), L. Krusin‐Elbaum(IBM (United States)), K.W. Guarini(IBM (United States)), Charles T. Black(IBM (United States)), Mark Tuominen(University of Massachusetts Amherst), Thomas P. Russell(Ingenierie des Materiaux polymeres)
Science
December 15, 2000
Cited by 2,095

Abstract

We show a simple, robust, chemical route to the fabrication of ultrahigh-density arrays of nanopores with high aspect ratios using the equilibrium self-assembled morphology of asymmetric diblock copolymers. The dimensions and lateral density of the array are determined by segmental interactions and the copolymer molecular weight. Through direct current electrodeposition, we fabricated vertical arrays of nanowires with densities in excess of 1.9 x 10(11) wires per square centimeter. We found markedly enhanced coercivities with ferromagnetic cobalt nanowires that point toward a route to ultrahigh-density storage media. The copolymer approach described is practical, parallel, compatible with current lithographic processes, and amenable to multilayered device fabrication.


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