Nanoimprint lithography for a large area pattern replication
A. Lebib(Laboratoire d'Étude des Microstructures), H. Launois(Centre National de la Recherche Scientifique), E. Cambril(Université Paris-Sud), J. Bourneix(Centre National de la Recherche Scientifique), F. Carcenac(Centre National de la Recherche Scientifique), Y. Chen(Laboratoire d'Étude des Microstructures), Laurent Couraud(Centre National de la Recherche Scientifique)
Cited by 74
Related Papers
Electron beam lithography: resolution limits and applications
|Applied Surface Science|2000|1.1k
Planar Patterned Magnetic Media Obtained by Ion Irradiation
|Science|1998|786
Comment on "V<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant="normal">O</mml:mi></mml:mrow><mml:mrow><mml:mn>2</mml:mn></mml:mrow></mml:msub></mml:mrow></mml:math>: Peierls or Mott-Hubbard? A View from Band Theory"
|Physical Review Letters|1994|346
Design and fabrication of blazed binary diffractive elements with sampling periods smaller than the structural cutoff
|Journal of the Optical Society of America A|1999|319