Electron beam lithography: resolution limits and applications
Christophe Vieu(Centre National de la Recherche Scientifique), H. Launois(Centre National de la Recherche Scientifique), L. Manin-Ferlazzo(Centre National de la Recherche Scientifique), Laurent Couraud(Centre National de la Recherche Scientifique), M. Mejias(Laboratoire d'Étude des Microstructures), Y. Chen(Laboratoire d'Étude des Microstructures), F. Carcenac(Centre National de la Recherche Scientifique), A. Lebib(Laboratoire d'Étude des Microstructures), A. Pépin(Centre National de la Recherche Scientifique)
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