Fractal analysis and atomic force microscopy measurements of surface roughness for Hastelloy C276 substrates and amorphous alumina buffer layers in coated conductors
Feng Feng(Tsinghua University), Zhonghe Han(North China Electric Power University), Zhihe Zhao(Beijing Institute of Technology), Shaozhu Xiao(Tsinghua University), Zhi Wang(Beijing Institute of Technology), Jun Wei(Tsinghua University), Y.-Y. Zhang(Tsinghua University)
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