Advanced process control applied to 90-nm lithography and etch
Gowri P. Kota(Lam Research (United States)), Adolph Hunter(ASML (United States)), Mircea Dusa(Texas Instruments (United States)), Jorge Luque(Lam Research (United States))
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
June 25, 2003
Cited by 3
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