Submicron contact lithography for etching and lift-off applications using an i-line negative-tone photoresist with controllable slope
H.H. Huang(University of Virginia), Arthur W. Lichtenberger(University of Virginia), D. Lea(IBM (United States))
Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE
July 7, 1997
Cited by 0
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