Dependence of physical properties and giant magnetoresistance ratio on substrate position during rf sputtering of NiO and α-Fe2O3 for bottom spin valves

Seongtae Bae(University of Minnesota), W. F. Egelhoff, P. J. Chen(National Institute of Standards and Technology), J.H. Judy(University of Minnesota)
Applied Physics Letters
September 12, 2002
Cited by 6


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