Characterisation of defects in very high deep-etch X-ray lithography microstructuresF. J. Pantenburg, Sven Achenbach, Jürgen MohrMicrosystem TechnologiesFebruary 24, 199810.1007/s005420050103Cited by 40SaveCiteExport RISWatch citationsAbstractRelated PapersNo related papers foundPowered by citation graph analysis