Diffusion of Ti, V and Nb in Ni<sub>3</sub>Al at Elevated Temperatures
Haruhiko Fukaya(Nagoya University), Haruyuki Inui(Kyoto University), Toshiyuki Koyama(National Institute for Materials Science), Katsushi Tanaka(Kyoto University), Wataro Hashimoto(Kyoto University), Md. Moniruzzaman(Islamic University of Technology), Yoshinori Murata(Japan International Research Center for Agricultural Sciences), Masahiko Morinaga(Central Research Institute of Electric Power Industry)
Defect and diffusion forum/Diffusion and defect data, solid state data. Part A, Defect and diffusion forum
April 13, 2010
Cited by 4
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