The use of atomic hydrogen for substrate cleaning for subsequent growth of II-VI semiconductors

Lionel Hirsch(Centre National de la Recherche Scientifique), Michelle Richards‐Babb(West Virginia University), S. L. Buczkowski(West Virginia University), Zhonghai Yu(Ministry of Education), T. H. Myers(Texas State University)
Journal of Electronic Materials
June 1, 1997
Cited by 17


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