Linear Scaling of Reset Current Down to 22-nm Node for a Novel $\hbox{Cu}_{x}\hbox{Si}_{y}\hbox{O}$ RRAM

Yang Li(Fudan University), Jin Wu(Rambus (United States)), Xiaopeng Tian(Fudan University), Y. L. Wang(Fudan University), Qingtian Zou(The University of Texas Southwestern Medical Center), M. Wang(Fudan University), Yu Liu(University of Waterloo), Rongqin Huang(Fudan University), Yandan Lin, Yali Song(Shandong University)
IEEE Electron Device Letters
October 31, 2011
Cited by 23


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