Range of boron ions in polymers: A SIMS study
D. M. Tennant(University of Tennessee at Knoxville), E.H. Westerwick(AT&T (United States)), A. H. Dayem(AT&T (United States)), Richard Howard(Samsung (United States))
Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena
January 1, 1985
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