A high voltage NMOSFET fabricated by using a standard CMOS logic process as a pixel‐driving transistor for the OLED on the silicon substrate
Cheon An Lee(Seoul National University), Byung‐Gook Park(Seoul National University), Myung Won Lee(Seoul National University), Jae Woo Kyung(Seoul National University), Il Whan Cho(Seoul National University), Jong Duk Lee(Seoul National University), Jihye Kong(Seoul National University), Sung Hun Jin(Seoul National University), Hyuck In Kwon(Seoul National University), Chang Ju Lee(Chosun University)
Cited by 2
Related Papers
Prognostic Value of Body Mass Index in Korean Patients With Renal Cell Carcinoma
|The Journal of Urology|2009|55
Fabrication and program/erase characteristics of 30-nm SONOS nonvolatile memory devices
|IEEE Transactions on Nanotechnology|2003|35
Serial Changes in Sexual Function Following Holmium Laser Enucleation of the Prostate: A Short-term Follow-up Study
|Korean journal of urology|2012|28