A Novel SONOS Memory with HfSiON/Si3N4/HfSiON Stack for Improved Retention
R. van Schaijk(Holst Centre (Netherlands)), Jan Wouters(KU Leuven), M. Slotboom(Philips (Belgium)), A. Huerta(Philips (Belgium)), F. Neuilly(IMEC), S. Beckx(Imec the Netherlands), Sven Van Elshocht(Columbia University), M. van Duuren(Philips (Belgium)), N. Akil(Philips (Belgium)), Z. M. Rittersma(Philips (Belgium))
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