A frequency domain measurement diagnostic technique for plasma-toolsV.J. Law, M. M. Watkins, A Pagliarani et al.|Measurement Science and Technology|2003Cited by 7
Harmonic monitoring of the switched silicon etched processV.J. Law, L. Lea, Nina F. Thornhill et al.|Journal of Physics D Applied Physics|2003Cited by 1
Remote-coupled Oxygen Plasma Harmonic Measurements for Process MonitoringAnthony J. Kenyon, L. Lea, VJ Law et al.|UCL Discovery (University College London)|2003Cited by 0