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Trap-Limited Electronic Transport in Assemblies of Nanometer-Size Ti<mml:math xmlns:mml="http://www.w3.org/1998/Math/MathML" display="inline"><mml:mrow><mml:msub><mml:mrow><mml:mi mathvariant="normal">O</mml:mi></mml:mrow><mml:mrow><mml:mn>2</mml:mn></mml:mrow></mml:msub></mml:mrow></mml:math>ParticlesPetra E. de Jongh, Daniël Vanmaekelbergh|Physical Review Letters|1996Cited by 322
Cu<sub>2</sub>O: Electrodeposition and CharacterizationPetra E. de Jongh, John J. Kelly, Daniël Vanmaekelbergh|Chemistry of Materials|1999Cited by 302
Photoelectrochemistry of Electrodeposited Cu[sub 2]OPetra E. de Jongh, John J. Kelly, Daniël Vanmaekelbergh|Journal of The Electrochemical Society|2000Cited by 260
Investigation of the Electronic Transport Properties of Nanocrystalline Particulate TiO<sub>2</sub> Electrodes by Intensity-Modulated Photocurrent SpectroscopyPetra E. de Jongh, Daniël Vanmaekelbergh|The Journal of Physical Chemistry B|1997Cited by 210