Influence of initial microstructure and impurities on Cu room-temperature recrystallization (self-annealing)M. Stangl, K. Wetzig, J. Thomas et al.|Microelectronic Engineering|2007Cited by 88
Size evaluation of nanostructured materialsM. Samadi Khoshkhoo, J. Eckert, S. Scudino et al.|Materials Letters|2013Cited by 20
Investigation of the microstructure of IrSi X thin filmsR. Kurt, K. Wetzig, W. Pitschke et al.|Fresenius Journal of Analytical Chemistry|1998Cited by 3
FIB Preparation of Holes with Large Aspect RatioJ. Thomas, Dina Lohse, B. Arnold et al.|Microscopy and Microanalysis|2007Cited by 0