Hydrogen plasma enhanced crystallization of hydrogenated amorphous silicon filmsK. Pangal, Temel Büyüklimanli, S. Wagner et al.|Journal of Applied Physics|1999Cited by 76
Integration of amorphous and polycrystalline silicon thin-film transistors through selective crystallization of amorphous siliconK. Pangal, S. Wagner, James C. Sturm|Applied Physics Letters|1999Cited by 16
p Channel thin film transistor and complementary metal–oxide–silicon inverter made of microcrystalline silicon directly deposited at 320°CY. Chen, S. Wagner, K. Pangal et al.|Journal of Non-Crystalline Solids|2000Cited by 15
Noninvasive measurement of charging in plasmas using microelectromechanical charge sensing devicesK. Pangal, James C. Sturm, Samara L. Firebaugh|Applied Physics Letters|1996Cited by 11