Advances in metal-based photoresist materials for EUV lithography and lithographic mechanisms
Yalong Wang(State Key Laboratory of Chemical Engineering), Chenguang Ouyang(State Key Laboratory of Chemical Engineering), Haojie Yu(State Key Laboratory of Chemical Engineering), Ying Zhang(State Key Laboratory of Chemical Engineering), Zheyi Zhu(State Key Laboratory of Chemical Engineering), Yanhui Zhang(Nanjing Xiaozhuang University), Ying Lu(Stanford University)
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