Endurable Ferroelectricity in Ho‐Doped HfO <sub>2</sub> Epitaxial Thin Films
Jiaqi Li(University of Science and Technology Beijing), Xianran Xing(University of Science and Technology Beijing), Jinglin Zhou(Beijing University of Chemical Technology), Han Wu(Qingdao University), Qinghua Zhang(Chongqing University of Posts and Telecommunications), Huanhua Wang(University of Massachusetts Amherst), Jiaou Wang(Chinese Academy of Sciences), Yu Chen(Jiangnan University), Qiang Li(Qingdao University), Xin Chen(South China Normal University), Jing Chen(University of Science and Technology Beijing), Xiaoge Wang(Pingdingshan University), Chen Liu(Chinese Academy of Sciences), Kun Lin(University of Shanghai for Science and Technology)
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