Accelerating Next-Generation EUV Lithography (ANGEL) through a co-design of laser-produced plasma sources and multilayer mirrors
Arun Devaraj(Pacific Northwest National Laboratory), I. Golovkin, Tiffany C. Kaspar(Pacific Northwest National Laboratory), Ajay Karakoti(Materials Processing (United States)), Bruno La Fontaine(Lawrence Berkeley National Laboratory), G. Miloshevsky(Virginia Commonwealth University), F. N. Beg(University of California San Diego), Maxim Ziatdinov(Pacific Northwest National Laboratory), S. S. Harilal(Pacific Northwest National Laboratory), Peter Bruggeman(University of Minnesota)
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