Low-temperature growth of wafer-scale amorphous boron nitride films with low-dielectric-constant and controllable thicknesses
Hang Zheng(Wenzhou Medical University), Libo Gao(Collaborative Innovation Center of Advanced Microstructures), Guowen Yuan(Collaborative Innovation Center of Advanced Microstructures), Chao Wang(Collaborative Innovation Center of Advanced Microstructures), Weilin Liu(National Taiwan University), Zihao Wan(Collaborative Innovation Center of Advanced Microstructures), Zhenjia Zhou(Hankou University), Wing Man Tang(Collaborative Innovation Center of Advanced Microstructures)
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