Compositionally-graded ferroelectric thin films by solution epitaxy produce excellent dielectric stability
Ruian Zhang(Zhejiang University), Zhaohui Ren(Shanxi Electromechanical Design and Research Institute), Xiaohe Miao(Westlake University), Yu Song(Beijing Institute of Technology), Houbing Huang(Beijing Institute of Technology), Zhe Ren(Shanxi University), Haojie Han(Tsinghua University), Qiaoshi Zeng(Shanghai Advanced Research Institute), Yong Jun Wu(Zhejiang University), Jing Ma(State Key Laboratory of New Ceramics and Fine Processing), Gaorong Han(Ningbo University), Yueqi Wang(Chinese Academy of Agricultural Sciences), Chen Lin(Zhejiang Lab), Zijun Zhang(Zhejiang University), Hongliang Dong(Center for High Pressure Science and Technology Advanced Research), He Tian(University of Antwerp), Yiran Sun(Zhejiang University)
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