High‐Yield Production of High‐κ/Metal Gate Nanopattern Array for 2D Devices via Oxidation‐Assisted Etching Approach (Small 51/2024)
Weida Hong(Chinese Academy of Sciences), Zengfeng Di(Chinese Academy of Sciences), Daobing Zeng(Capital Medical University), Zhongying Xue(Chinese Academy of Sciences), Miao Zhang(Baoding University), Jiejun Zhang(Jinan University), Chen Wang(Kunming University of Science and Technology), Ziao Tian(Chinese Academy of Sciences)
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