Growth behavior of cristobalite SiO2 coating on 4H–SiC surface via high-temperature oxidation

Moyu Wei(Institute of Semiconductors), Xingfang Liu(Institute of Semiconductors), Jingyi Jiao(Institute of Semiconductors), Yunkai Li(China Agricultural University), Siqi Zhao(Chinese Academy of Sciences), Guoguo Yan(Chinese Academy of Sciences)
Ceramics International
June 16, 2024
Cited by 5


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