Superionic fluoride gate dielectrics with low diffusion barrier for two-dimensional electronics

Kui Meng(Collaborative Innovation Center of Advanced Microstructures), Hongtao Yuan(National Engineering Research Center of Electromagnetic Radiation Control Materials), Genda Gu(Brookhaven National Laboratory), Yurong Yang(Collaborative Innovation Center of Advanced Microstructures), Harold Y. Hwang(SLAC National Accelerator Laboratory), Feng Qin(Collaborative Innovation Center of Advanced Microstructures), Zeya Li(Collaborative Innovation Center of Advanced Microstructures), Jiayi Li(Collaborative Innovation Center of Advanced Microstructures), Yi Cui(China Meteorological Administration), Junwei Huang(Collaborative Innovation Center of Advanced Microstructures), Caiyu Qiu(Nanyang Technological University), Ding Zhang(South China Normal University), Yilin Zhang(Collaborative Innovation Center of Advanced Microstructures), Qi‐Kun Xue(Southern University of Science and Technology), Yuhe Deng(Collaborative Innovation Center of Advanced Microstructures), Peng Chen(Qilu University of Technology), Xingyue Ma(Collaborative Innovation Center of Advanced Microstructures)
Nature Nanotechnology
May 15, 2024
Cited by 35


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