Ultrahigh-reflective optical thin films prepared by reactive magnetron sputtering with RF-induced substrate bias
Tung-Hsun Chung(University of Science and Technology of China), Jian-Wei Pan(Heidelberg University), Yu-Ao Chen(University of Science and Technology of China), Xing-Yang Cui(University of Science and Technology of China), Han-Ning Dai(University of Science and Technology of China), Qi-Hang Zhang(University of Science and Technology of China), Rong Liao(University of Science and Technology of China), Qian-Cheng Lin(University of Science and Technology of China), Yong-Heng Huo(University of Science and Technology of China), Meng Wang(Tongji University), Xiao-Lu Zou(University of Science and Technology of China), J Zhang(Beijing Academy of Quantum Information Sciences), Xian-Qing Zhu(University of Science and Technology of China), Ping Xu(University of Science and Technology of China)
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