On-Chip Fabrication-Tolerant Exceptional Points Based on Dual-Scatterer Engineering

Jiewen Li(Harbin Institute of Technology), Xiaochuan Xu(Ministry of Education of the People's Republic of China), Yunxu Sun(Harbin Institute of Technology), Wanxin Li(Harbin Institute of Technology), Feng He(Harbin Institute of Technology), Jianan Duan(Chinese Academy of Sciences), Yi Zou(Harbin Institute of Technology), Perry Ping Shum(Southern University of Science and Technology), Yong Yao(Shenzhen Institute of Information Technology), Jiawei Wang(Guilin Medical University), Jinzhao Wang(Harbin Institute of Technology), Feng Yang(Harbin Institute of Technology), Jinna Chen(Southern University of Science and Technology)
Nano Letters
March 20, 2024
10.1021/acs.nanolett.3c05075
Cited by 20

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