Less Energetic Routes for the Production of SiOx Films from Tris(dimethylamino)silane by Plasma Enhanced Atomic Layer Deposition
Danielle C. F. S. Spigarollo(Universidade de Sorocaba), Elidiane Cipriano Rangel(Universidade de Sorocaba), Tiago Fiorini da Silva(Universidade de São Paulo), Tsegaye Gashaw Getnet(Bahir Dar University), Nilson Cristino da Cruz(Universidade de Sorocaba), Rita C. C. Rangel(Universidade de Sorocaba)
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