Atomic layer deposition of hafnium oxide on porous silicon to form a template for athermal SERS-active substrates
Kseniya Girel(Belarusian State University of Informatics and Radioelectronics), Hanna Bandarenka(University at Buffalo, State University of New York), Andrey Tarasov(National Research University of Electronic Technology), Е. М. Еганова(Russian Academy of Sciences), Д. В. Новиков(National Research University of Electronic Technology), Aliaksei Barysiuk(Belarusian State University of Informatics and Radioelectronics), Kristina I. Litvinova(Russian Academy of Sciences), Sergey Dubkov(National Research University of Electronic Technology), Aliaksandr Burko(Belarusian State University of Informatics and Radioelectronics), Siarhei Zavatski(Belarusian State University of Informatics and Radioelectronics)
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